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USHIO QZ7012 Photolithography Mask for UV Processing

SKU: QZ7012

(1 review)
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Description

USHIO QZ7012

Precision optical mask for transferring fine circuit and device patterns during photolithography processes

Brand USHIO
Model QZ7012
Voltage Not applicable
Country of Origin Japan
Weight Approximately 0.2 kg
Dimensions Approximately 177.8 x 177.8 mm, 7-inch square
Warranty 6 months
Certifications Not specified
SKU / MPN QZ7012
What’s in the box Photolithography mask, protective case, inspection documentation
Product Type Photolithography mask
Substrate Optical quartz glass
Mask Format 7-inch square
Pattern Material Chrome opaque film
Process Compatibility Ultraviolet photolithography exposure
Application Precision pattern transfer

Key benefits: High optical clarity, stable quartz substrate, accurate pattern transfer, cleanroom-compatible handling, and repeatable exposure performance

Typical applications: Semiconductor prototyping, MEMS fabrication, microelectronics, sensor production, wafer patterning, and laboratory photolithography

Lifecycle: Active specialty optical component; availability and revision status should be confirmed with USHIO

   
       

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Exact match for many brands

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Guaranteed for one full year

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1 review for USHIO QZ7012 Photolithography Mask for UV Processing

  1. David L. –

    Product was exactly as described. Our engineers were pleased with the performance.

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