Description
AMAT Plasma Source 0026-73995 REV 1 High-Performance Device
High-performance RF plasma source for semiconductor etching and deposition processes, offering reliable power delivery and process stability.
| Brand | AMAT |
| Model | 0026-73995 REV 1 |
| Voltage | Not specified |
| Country of Origin | United States |
| Weight | 2.5 kg |
| Dimensions | 200 x 150 x 100 mm |
| Warranty | 1 year |
| Certifications | CE, SEMI S2, RoHS |
| SKU / MPN | 0026-73995 |
| What’s in the box | Plasma source unit, mounting hardware, interconnect cable, installation guide |
| RF Power | 3000 W (max) |
| Frequency | 13.56 MHz |
| Gas Compatibility | Ar, O2, CF4, SF6, N2 |
| Cooling Method | Water-cooled (5 L/min at 20°C) |
| Impedance | 50 ohms |
| Connector Type | 7/16 DIN female |
Key benefits: High power density, wide gas compatibility, robust water cooling, precise impedance matching, long operational life
Typical applications: Semiconductor wafer processing, plasma-enhanced chemical vapor deposition (PECVD), reactive ion etching (RIE), surface cleaning
Order number: AMAT Plasma Source 0026-73995 REV 1 High-Performance Device
Lifecycle: Active
Our Advantages
Exact match for many brands
We make replacements easy with an exact match for almost any brand.
We use OEM catalogs to match your part number
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Orders usually ship the same day
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Guaranteed for one full year
All of our New Surplus and Reconditioned products come with a 1 year warranty.
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Richard S. –
Excellent built quality. Integrated easily into our existing control system.